Abstract
To study effect of residual gas in vacuum system on structure and electrical performance of activated AlGaN photocathodes, adsorption models for H2O, CO and CO2 adsorbed on Al0.5Ga0.5N activated surfaces are established and investigated. The results indicate that activated Al0.5Ga0.5N surfaces are not easily adsorbed by residual gases compared to pristine surface. For Al0.5Ga0.5N thin film, H2O and CO exhibit higher affinity for adsorption on Cs/NF3-activated surfaces, while CO2 shows greater tendency to adsorb on Cs-activated surface·H2O, CO and CO2 are most easily adsorbed on Cs/NF3-activated surface for Al0.5Ga0.5N nanowires. Work function of Cs/NF3-activated thin film surface is 2.34 eV, and after adsorbing H2O, CO and CO2, work functions are 1.84 eV, 2.37 eV, and 3.43 eV, respectively. This means that residual gas will increase work function and is harmful to quantum efficiency improvement.
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