Abstract
A Nb-Ta thin film compositional spread obtained from a co-sputtering process was analysed. The microstructure and crystallographic investigations revealed the presence of a compositional threshold at Nb-60 at.%Ta where the change from tetragonal to cubic symmetry was evidenced by a mixed tetragonal-cubic phase. The electrochemical properties of the anodic oxides were studied via cyclic voltammetry and the oxide formation factors were mapped along the entire compositional spread. Values ranging from 1.8nm·V−1 at the Ta-rich side to 2.6nm·V−1 at the Nb-rich side of the library were measured. All Nb-Ta mixed anodic oxides were found to exhibit a type-n semiconducting behaviour as evidenced by Mott-Schottky analysis. The chemical composition of the surface anodic oxides differed from the composition of the parent metal alloys and no clear trend could be identified regarding their mismatch.
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