Abstract
Electrochemical atomic layer etching (e-ALE) presents a facile approach for etching metals with unprecedented atomic-scale precision. In e-ALE of copper (Cu) metal, the crucial first step is the surface-limited sulfidization of Cu to form a cuprous sulfide (Cu2S) monolayer. In this work, we investigate the thermodynamic, kinetic and transport properties of the sulfidization reaction. By comparing steady-state and non-steady-state experimental studies with equilibrium and non-equilibrium (diffusion-reaction) models, system parameters such as equilibrium constant, reaction rate constant and diffusion coefficient were precisely determined. Knowing these parameters enabled the quantification of rate-limiting factors in the sulfidization process thereby improving our understanding of the chronoamperometry features observed in sulfidization studies.
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