Electrochemical and AFM evaluation of hazard compounds–DNA interaction

Abstract

The evaluation of the interaction of hazard compounds, divalent cations Pb, Cd, Ni and Pd, with double-stranded DNA (dsDNA), forming a metal–DNA complex, was studied by atomic force microscopy (AFM) and differential pulse voltammetry (DPV) on two carbon electrode surfaces, highly oriented pyrolytic graphite (HOPG) and glassy carbon (GC). The electrochemical behaviour of these metal–DNA complexes was related to the different adsorption patterns and conformational changes obtained by the AFM images on the HOPG surface. The dsDNA interaction was specific with each metal cation, inducing structural changes in the B-DNA structure, local denaturation of the double helix and oxidative damage. AFM images showed an increase of the electrode surface coverage for lead, cadmium and nickel DNA complexes. For cadmium and nickel–DNA complexes oxidative damage to DNA was electrochemically detected for the concentrations studied. Palladium interaction with dsDNA induced condensation of the dsDNA secondary structure, which led to the aggregation of helixes forming very compact and thick filaments in the network film. The voltammetric data for the palladium–DNA complex showed a sharp decrease of the guanosine and adenosine oxidation peak currents, consistent with the AFM results of DNA condensation in the presence of palladium, but no DNA oxidative damage was detected for the range of concentrations used.