Abstract
Thin films were prepared by quenching Cu-Ag vapour onto substrates cooled with liquid nitrogen. The films were investigated by means of the four-probe technique and electron energy loss spectroscopy. The resistivity was found to be very sensitive to the deposition rate and the substrate temperature. The resistivity of the films depends markedly on the concentration, exhibiting two discontinuities at the boundaries of the amorphous range (30–70 at.%) and peaking at 50 at.%. Transmission energy loss spectroscopy revealed differences in the spectra of amorphous and crystalline specimens. The conductivity values calculated from the plasmon loss position and linewidth on the basis of the nearly-free-electron model were in general higher than those directly measured. This disagreement is due to the limited validity of the model for strong scatterers such as copper and silver. However, the calculated drops in resistivity during phase transitions were in good agreement with those measured.
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