Abstract
We discuss the electrical resistivity and thermal stability of smooth thin silver (Ag) films characterized by significantly lower root mean square (RMS) surface roughness, peak-to-valley height distribution, and grain-size distribution. The smooth film was prepared by using a very thin (~1-2 nm) nucleation layer of evaporated germanium (Ge) prior to Ag evaporation. The sheet resistance of the rough silver (10 nm Ag) film is RAg-rough ~51 Omega/sq compared to the smooth silver (10 nm Ag/2 nm Ge) film with RAg.smooth ~22 Omega/sq. The smooth Ag is also shown to be thermally more stable for temperatures less than 120degC.
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