Abstract
In this study r.f. magnetron sputtering is employed to deposit amorphous Ca-doped titanate film on silicon substrate. The as-deposited BaTiO 3 film has a 1 MHz dielectric constant of 14 and a refractive index of 1.9 at a wavelength of 6328 Å. The capacitance-voltage characteristics of the BaTiO 3 film suggest a Poole-Frenkel transport mechanism with oxygen vacancies as one of the positively charged traps. The remanent polarization in the BaTiO 3 films affects its current-voltage curve. The fatigue behaviour of the BaTiO 3 films is improved by the introduction of oxygen gas during sputtering and/or the addition of dopant calcium. No fatigue is observed by the (Ba 0.9Ca 0.1) TiO 3 film up to a switching cycle of 10 10.
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