Abstract

Micro-glass capillaries emerge as an important tool for the lossless guiding and focusing of ion beams (Kojima 2018 J. Phys. B: At. Mol. Opt. Phys. 51 042001). The self-focusing mechanism of the capillaries is primarily governed by charged patches induced on their inner walls by the incident beam (Stolterfoht et al 2002 Phys. Rev. Lett. 88 133201). However, the dominance of space charge forces over self-focusing forces in intense (J ≈ 1 A m−2) ion beams establishes a self-focusing limit (Maurya et al 2019 J. Phys. D: Appl. Phys. 52 055205), posing challenges to beam focusing beyond this limit. In this work, a novel method is introduced, demonstrating electrical control over the charge patch dynamics through an externally applied bias voltage, thereby enabling the focusing of Ar ion beams beyond the self-focusing limit. Experimental results reveal that adjusting the biasing voltage allows overcoming the self-focusing limit, resulting in the generation of a high-intensity ( Jout≈3.05×105 A m−2) nano-beam (∼160 nm). Furthermore, electrical control is shown to enhance the performance of both straight and tapered capillaries (SC/TC), with the TC being more effective for nano-beam generation. A Particle-In-Cell (PIC) simulation code has been developed to explain the experimental results. The implications of high-intensity nano ion beams in advancing nanopatterning, nanoscale material analysis, and matter wave interferometry, underscore significant contributions to research and innovation within electronics, materials science, nanotechnology, and emerging quantum technologies.

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