Abstract
The TiB2films were prepared on AISI 316L substrate by magnetron sputtering with various powers to investigate the influence of sputtering power on the microstructure and hardness of films. The crystalline structures and cross-sectional morphology of TiB2films were characterized by X-ray diffraction (XRD) and field emission scanning electron microscope (FESEM), respectively. The hardness was measured by nano-indentation. XRD patterns showed that the preferred orientation of TiB2films transferred from (100) to (001) with the increase of power. It can be observed that each film processed homogeneous by the cross-sectional images. The hardness of films varied from 21 to 32 GPa depending on the value of power. The enhancement of hardness may be attributed to the effect of the residual stress state and the microstructure of films. Furthermore, the effects of power on hardness of TiB2films were discussed in details.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
