Abstract
Amorphous carbon nitride (a-C1-xNx) films were prepared by magnetron sputtering using nitrogen (N2) and oxygen (O2) gases in order to reduce the sp2 structural region and to reduce triple bonding between carbon and nitrogen atoms (C≡N) with oxygen radical. Furthermore, these films were prepared at liquid-nitrogen temperature in order to increase the nitrogen concentration. Electron spin resonance (ESR), infrared (IR) absorption, ultra-violet visual (UV-vis) spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to investigate the effects of O2 gas addition and substrate cooling on the preparation of a-C1-xNx films by magnetron sputtering.
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