Abstract
Amorphous carbon nitride (a-C1-xNx) films were prepared by magnetron sputtering using nitrogen (N2) and oxygen (O2) gases in order to reduce the sp2 structural region and to reduce triple bonding between carbon and nitrogen atoms (C≡N) with oxygen radical. Furthermore, these films were prepared at liquid-nitrogen temperature in order to increase the nitrogen concentration. Electron spin resonance (ESR), infrared (IR) absorption, ultra-violet visual (UV-vis) spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to investigate the effects of O2 gas addition and substrate cooling on the preparation of a-C1-xNx films by magnetron sputtering.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
