Abstract
The CO oxidation activity of size-selected Pd20 clusters deposited on alumina films grown on Re(0001) is shown to depend strongly on the film thickness in the 0 to 10 nm range. For the reaction conditions of these experiments, binding and activation of O2 is shown to be the limiting process, which can be varied by a factor of 2 by tuning the alumina film thickness, due to effects on both the electronic structure of the alumina film and the morphology of the supported Pd clusters. The alumina films are shown to be doped with Re atoms diffusing from the Re(0001) substrate, leading to a strong dependence of the surface electronic properties on alumina thickness, which in turn, results in the observed thickness-dependent activity of the Pd20.
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