Abstract

The ultrafine grained pure Ni and Ni-W alloy were obtained by electrodeposition technique and subsequent annealing treatment. The effects of annealing on the microstructures, the mechanical properties and the corrosion resistance of pure nickel and Ni-W alloy were investigated. The EBSD analyses showed that annealed pure Ni displayed preferred grain orientation, while annealed Ni-W alloy showed relatively more random grain orientation. Moreover, abnormal grain growth was observed in annealed pure Ni, while annealed Ni-W alloy displayed a more uniform grain size distribution. It could be predicted that solid solution of tungsten significantly suppressed grain growth and induced uniform grain size distribution during low temperature annealing process. Moreover, comparing with annealed pure Ni, the tungsten in annealed Ni-W alloy changed the semiconducting characteristic of surface passive films. Annealed Ni-W alloy showed higher corrosion resistance than annealed pure Ni in 3.5 wt% NaCl solution and in borate buffer solution.

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