Abstract
Mist chemical vapor deposition method was used to synthesize pure anatase phase titanium dioxide thin films on glass, quartz glass, gallium doped zinc oxide film and p-type silicon substrates. The effects of substrates on the structural and optical properties of TiO2 thin films were investigated. TiO2 films deposited on all substrates had the same preferred growth along (101) orientation which crystallize in the anatase phase. The films grown on glass and quartz glass showed better crystallinity than those grown on gallium doped zinc oxide film and p-type silicon. From the morphological results, uniform TiO2 films with roughness below 10 nm were obtained on all substrates. The transmittance of obtained TiO2 films on transparent substrates was greater than 75% in the visible region.
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