Abstract
Ta 2O 5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing(RTA). Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta 2O 5 thin films were investigated. As-deposited Ta 2O 5 thin films are amorphous. It takes hexagonal structure ( δ-Ta 2O 5) after being annealed at 800 °C. A transition from δ-Ta 2O 5 to orthorhombic structure ( L-Ta 2O 5) occurs at 900–1 000 °C. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.
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