Abstract
In the present study, we investigate the effect of substrate temperature, annealing temperature, and annealing time of the MgF2 coating material on the physical properties of the MgF2 thin film. The MgF2 thin film has been fabricated by MgF2 annealed coating material by thermal evaporation method. Our experimental results indicate that the oxidation of MgF2 in the air oven started at 800 ∘C. The optical transmittance of the MgF2 thin film decreases by increasing the annealing temperature and annealing time of MgF2 coating material. The results of the EDX test show that by increasing the annealing temperature and annealing time of MgF2 coating material, the content of oxygen element in the MgF2 thin film increases and the amount of fluorine element reduces.
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