Abstract

In order to minimize emission of formaldehyde from urea–formaldehyde resins (UF) and to improve their thermo-oxidative behavior, the effect of low γ-irradiation on hydrolytic and thermo-oxidative stability of nano-silica modified UF resin, modified UF resin with wood flour (Pinus silvestris L.) as natural filler and modified UF resin with mixture of SiO2/WF fillers were investigated. The hydrolytic stability of modified UF resins was determined by measuring the mass loss and liberated formaldehyde concentration of modified UF resins after acid hydrolysis. The studied modified UF resins have been irradiated (50kGy) and effect of γ-irradiation was evaluated on the basis of percentage of liberated formaldehyde before and after irradiation. The minimum percentage (1.23%) of liberated formaldehyde and mass loss of a 25.35% were obtained in wood flour modified UF resin after γ-irradiation which indicate significant improvement in the hydrolytic stability compared to other modified UF resins. The effect of γ-irradiation was evaluated also on the basis of thermo-oxidative behavior of the same modified UF resins before and after irradiation. The thermo-oxidative behavior was studied by non-isothermal thermo-gravimetric analysis (TG), differential thermo-gravimetry (DTG) and differential thermal analysis (DTA) supported by data from IR spectroscopy. After γ-irradiation, the shift of DTA peaks a higher temperature indicates that thermo-oxidative stability of modified UF/SiO2/WF is increase.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.