Abstract
The oxidation resistance and tribological behavior of CrAlN/SiN x multilayer films with different interface structures were investigated. The multilayer film exhibited better oxidation resistance than the monolithic CrAlN film after oxidation at 900 °C and 1000 °C for 10 h. The crystalline SiN x sublayer was beneficial to oxidation resistance at 900 °C in contrast to the trend observed after oxidation at 1000 °C. The stacking faults generated in the multilayer film were induced by the oxidation of SiN x . The diffusion mechanism changed from the outward diffusion of cations to an inward diffusion of anions when the temperature was increased to 1000 °C. The multilayer film with a crystalline interface exhibited lower coefficient of friction (COF) and better tribological properties than the CrAlN film and multilayer with an amorphous interface.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
