Effect of electron bombardment during deposition of cadmium sulfide films using a hot-wall technique

Abstract

The use of electron-beam irradiation combined with a hot-wall technique during deposition of CdS films is described. CdS films 2–10 μm thick were thermally deposited with and without electron bombardment on glass substrates using a hot-wall technique under a pressure greater than 1 × 10−6 Torr (1 Torr = 133.3 Pa). Film properties were studied using low-angle X-ray diffraction, scanning electron microscopy, optical microscopy using a chemical decoration technique, Hall-effect measurements, and temperature-dependent dark conductivity. The surface grain size varied from 2 to 5 μm and films were brownish orange with a smoky appearance.