Abstract
We improved EUV mask imaging performance through phase and amplitude optimization between 0th and 1st diffraction orders. A specific phase difference between the 0th and 1st diffraction orders can reduce the aerial image split and then improve the imaging performance. The optimum phase difference is 27 degrees in the 14 nm HP L/S pattern and 36 degrees in the 12 nm HP L/S pattern. This effect becomes more evident with the amplitude balancing between the two diffraction orders.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
