Abstract
It is well-known that the gate capacitance of MOS structures of n-channel inversion layers on small-gap semiconductors is very important parameter since the MOS capacitance can be very easily controlled by varying the gate voltage and also since it explores various other fundamental features of semconductor surfaces in MOS structures. However, the gate capacitance of MOS structures of n-channel inversion layers on ternary semiconductors in the presence of crossed electric and magnetic fields has yet to be investigated since the cross-field configuration is of fundamental importance for classical and quantum transport phenomena.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
