Abstract
The effects of As overpressure during annealing on nonuniformity, i.e., the variations of sheet carrier concentration and Hall mobility across wafers, have been studied for Si-implanted undoped semi-insulating GaAs. The nonuniformity was found to be suppressed by annealing under high As overpressure. It is suggested that the high As overpressure suppresses the As vacancy generation during annealing which may induce the nonuniformity due to the local variation of compensation ratio of [SiAs]/[SiGa] around a dislocation.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
