Abstract
A porous SiC (PSC) layer was fabricated by anodization of a 1.6 μm thin SiC layer deposited onto p-type Si(1 0 0) substrate by pulsed laser deposition (PLD), using a hot-pressed 6H-SiC( p) as sputtered target. p-Type PSC layers were fabricated by anodization in HF/ethylene glycol electrolyte (1:1 by vol.) at different etching times. The properties of the PSC layer formed by this method were investigated by X-ray diffraction (XRD), secondary ion mass spectrometry (SIMS), scanning electron microscopy (SEM) and photoluminescence (PL). The results show, that the growth layer was crystalline and PL spectra exhibit blue band emission centered at 2.95 eV. In addition, the results indicate clearly an increase in PL intensity by ten times of magnitude compared to that exhibited by the unetched sample.
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