Abstract
Van de Pauw Hall measurement is an effective method to characterize the properties of semiconductors, such as bulk concentration, mobility, and resistivity, all of which are used to describe the purity level in the semiconductors. However, the performance of the ohmic contacts has a direct impact on the reliability and accuracy of the results obtained from the Van de Pauw Hall measurement. In the present work, the influences of different annealing techniques on the performance of the InSn ohmic contacts have been investigated using a High Purity Germanium (HPGe) crystal sample. The results show that the preferred annealing condition is at 400 °C for 1 hour, which has provided a significant improvement of the InSn contact quality and microscopic homogenization of the impurities in the HPGe crystal. The carrier concentration, charge mobility, and resistivity of the sample annealed at 400 °C for 1 hour are 5.772×1010/cm3, 1.883×104× cm2/Vs, and 5.795×103×Ω cm at 77 K, respectively.
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