Dual-Gate Phototransistor With Perovskite Quantum Dots-PMMA Photosensing Nanocomposite Insulator

Abstract

Dual-gate InGaZnO thin-film-transistors were fabricated to demonstrate their feasibility as phototransistors by fully exploiting the perovskite quantum dots (QDs) with superior quantum yield. Here, we show that by coupling the top-gate photo sensing polymethyl methacrylate (PMMA)/CsPbBr3 QDs hybrid insulator with the classic SiO2 bottom-gate insulator, the phototransistor can exhibit a combination of excellent detective performance ( $3.75\times 10^{12}$ Jones detectivity and $1\times 10^{3}\text{A}$ /W responsivity) and electrical performance (small 3-V threshold voltage, 0.53-V/decade substhreshold slop, and 0.1-V hysteretic threshold voltage’s shift). Additionally, this dual-gate phototransistor exhibits high stability and accelerated detecting speed ( $ ) due to the inorganic perovskite QDs/PMMA hybrid gate insulator. Our results suggest that in a proper device architecture, perovskite nanomaterials can be promising candidates for cost-effective, high-performance phototransistor.