Abstract
The bilayer structure of FeBSi/Si with thickness of the nonmagnetic interlayer t equal to 1, 2, 5 and 15 nm and thickness of the first ferromagnetic layer (30 nm) and the second (15 nm) was investigated. As was indicated from the observed domain structure for t up to 15 nm, the interaction between the domain walls is not sensitive to the value of t even if t = 15 nm. The creation of a new type of domain wall — multilayer cross tie wall — is also observed.
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