DLC coating on a micro-trench by bipolar PBII&D and analysis of plasma behaviour

Abstract

Bipolar plasma-based ion implantation and deposition (bipolar PBII&D) has been recognized as a promising technique for coating deposition on complex three-dimensional targets. As the target is fully immersed in the plasma throughout the process, the plasma sheath can be formed with quite high conformability around the target. In this study, diamond-like carbon (DLC) coating was deposited on a micro-trench pattern by using bipolar PBII&D, and the structure of the DLC film across the overall surface region of the trench was examined by making use of their corresponding Raman spectra. The two types of negative high voltage pulses were applied to the targets for comparison: −0.5 and −15 kV. The scale of the micro-trench used in the study is much smaller than that of the plasma sheath produced under these negative voltages (about 1 cm and 14 cm for −0.5 kV and −15 kV, respectively). The plasma behaviour (i.e., ion flux, impact angle and energy) in the surrounding of the micro-trench was calculated with the particle-in-cell Monte Carlo collision method (PIC-MCCM). As a result, DLC film was successfully coated on the overall surface of the trench. When the applied negative voltage was −0.5 kV, the structure of DLC film coated on the sidewall of the trench became a more polymer-like carbon (PLC) than those of the top and bottom surfaces. This, as indicated by the simulation results, is because the ions, which strike the sidewall, tend to have less incident energy. Whereas in the case of −15 kV, the DLC film on the sidewall was a more graphite-like carbon (GLC) film, despite its smaller incident ion energy in comparison to those of the top and bottom surfaces. This phenomenon is attributed to the sputtering effect from the bottom surface of the trench, as evidenced by the plasma simulation.