Abstract
The effect of high-power ion-beam irradiation on thin metal (Al, Cu, Cr) films of varying (0.08–1.9 µm) thickness deposited onto dielectric sodium silicate glass and glass-ceramic substrates is investigated. The strong effect of the ion current density and film thickness on the surface morphology under irradiation is found. The features of the dispersion of a chromium thin film having high adhesion to the dielectric substrate by a high-power ion beam are examined.
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