Abstract
Hydrogen silsesquioxane (HSQ) is a popular high resolution negative tone resist for electron beam lithography. This work investigates whether a HSQ-like film can be mimicked via plasma enhanced chemical vapor deposition (PECVD) rather than spin coating. It is shown that PECVD oxide acts as mainly a negative tone resist.
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More From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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