Abstract
High quality diamond films have been deposited on Si(100) mirror surface without using any surface pretreatment such as abrasive diamond scratching, diamond-like carbon predeposition or oil treatment. The experiments are carried out in the hot filament chemical vapour deposition system by using the mixture of methane, hydrogen and oxygen. The films show the well-defined facets and are confirmed by Raman spectroscopy and scanning electron microscopy to be high quality diamond films. In this deposition process, higher substrate temperature, high filament temperature and oxygen addition play the important roles in diamond nucleation on the mirror-smooth Si(100) surface.
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