Abstract
Diffusion of nonstoichiometry-related point defects from a LEC-grown GaP substrate to a Te-doped GaP n-type epitaxial layer was investigated by means of photocapacitance. It was revealed that deep donor level at E C−2.1 eV was introduced into GaP substrate with annealing under phosphorus vapor pressure. Thus, the 2.1 eV deep level is thought to be involved with excess P atoms such as interstitial phosphorus atoms. In Te-doped crystal, 2.1 eV level was detected and the density increased as the time of substrate annealing increased. By measuring PHCAP spectra of samples with different thickness of epitaxial layer, diffusion profile of the defects from the substrate interface was obtained. From this, the diffusion coefficient at 850°C is estimated to be ∼8×10 –11 cm 2/s.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
