Diffraction of Gauss beam by a resistive half-plane in an anisotropic plasma

Abstract

The theoretical investigation of Gauss beam diffraction by a resistive half-plane surrounded by an anisotropic plasma is presented. For this purpose, an integral theory which yields the scattered fields in terms of the Fresnel function is considered. The kernel of the scattering integral is arranged, according to the relation between scattered geometric optics (GO) fields and the transition boundaries, to obtain the scattered fields. The magnetic line source illumination is considered since a single magnetic field component is affected by the anisotropy. Later, complex point source method is used for evaluation of Gauss beam diffraction. The resultant waves are plotted and discussed for the limiting cases of anisotropic medium and resistive half-plane.