Abstract
The growth properties of gold films sputtered at room temperature (RT) and at 550 °C on O-terminated ZnO ( 0 0 0 1 ¯ ) / Al 2 O 3 ( 1 1 2 ¯ 0 ) substrates were investigated by X-ray scattering, atomic force microscopy and by scanning electron microscopy. A maximal lattice mismatch of about 1.21% and 0.5% has been found in the growth direction for samples grown at 550 °C and RT, respectively. The chemical composition was determined by X-ray photoemission spectroscopy, which revealed a completely covered ZnO ( 0 0 0 1 ¯ ) surface by Au after sputtering at RT. In addition, these measurements show that Au grows layer-by-layer at RT, but forms clusters if sputtered at 550 °C (Volmer–Weber growth mode).
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
