Abstract
Abstract Photoelastic measurement is a sensitive optical technique to map strain fields in otherwise isotropic materials. To extend this method to the submicron scale, we combine dynamic polarimetry with nearfield scanning optical microscopy (NSOM) and construct a polarization modulation NSOM (PMNSOM). The 670 nm laser light passes first through a linear polarizer (oriented at 90°), and then through a photoelastic modulator (PEM), and finally through a quarter wave plate. The PEM introduces a sinusoidally time varying phase shift δ0sin(2πft) into the +45° polarization component, where the modulation frequency/is the resonant frequency (50 kHz) of the PEM quartz element. The quarter wave plate (oriented at 0°) transforms this elliptically polarized light into linearly polarized light with its orientation varying sinusoidally at the modulation frequency. This polarized light is then coupled into a single-mode optical fiber leading to the NSOM tip.
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