Abstract
MoSi2 coating has been developed on Nb-1Zr-0.1C alloy surface by firstly depositing Mo using magnetron sputtering technique and subsequent Si deposition by a chemical vapor deposition process namely pack siliconizing. About 2 μm thick interdiffusion zone is formed after annealing the Mo-coated Nb-alloy at 1500°C. The detailed characterization studies using XRF, SEM, EDS and EBSD of the pack siliconized coated alloy revealed the formation of an outer MoSi2 layer and an inner NbSi2 layer. About 25 μm thick MoSi2 layer comprising of fine grained microstructure is formed at 1100°C.
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