Abstract
This paper reports a novel maskless nanoscale material etching method based on microplasma devices arrays. That is, inverted pyramidal microplasma devices arrays are integrated into the scanning probe tips array to realize maskless nanoscale material etching with advantages of high efficiency, large area and low cost. A 4×4 inverted pyramidal microplasma device array with each microcavity dimension of 50μm was successfully fabricated by MEMS process. Experiment results showed that the microplasma devices arrays could ignite in rare gas Ar under dc excitation. Ballast resistance in electrical testing system played an important roles in device array ignitions. V-I characteristics of the device array at 10kpa of Ar was in negative glow discharge mode. This work may lay a good foundation for future maskless microplasma nanoscale material etching.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
