Abstract
A combined sensor for the investigation of plasma-based surface engineering processes has been developed, which basically consists of a quartz crystal microbalance that is simultaneously used as a heat flux sensor and a planar Langmuir probe in one active element. The sensor can thus measure deposition flux, heat flux, and charged particle flux laterally resolved at the same time and position. The setup and working principle of the sensor are shown, and the suitability for process investigations is demonstrated exemplarily for a dc magnetron sputtering discharge for Ti thin film deposition.
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