Abstract
We have developed a 2 kHz repetition rate discharge-pumped molecular fluorine laser oscillating at 157 nm. It has achieved an average power of 22 W at the repetition rate of 2 kHz with a newly developed solid-state pulse power module which has a maximum input energy of 6 J/pulse. The multi-kilohertz F2 laser is a key device for 157 nm lithography aimed at the design rule of below 0.10 microns.
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