DEVELOPMENT AND COMPARISON OF MICROMACHINED INDUCTORS FOR RF APPLICATIONS

Abstract

International Journal of Computational Engineering ScienceVol. 04, No. 02, pp. 363-367 (2003) Wireless MEMS/RF MEMSNo AccessDEVELOPMENT AND COMPARISON OF MICROMACHINED INDUCTORS FOR RF APPLICATIONSJIANBO SUN, JIANMIN MIAO, TIETUN SUN, and HONG ZHUJIANBO SUNMicromachines Center, School of Mechanical and Production Engineering, Nanyang Technological University, Singapore, 639798, Singapore Search for more papers by this author , JIANMIN MIAOMicromachines Center, School of Mechanical and Production Engineering, Nanyang Technological University, Singapore, 639798, Singapore Search for more papers by this author , TIETUN SUNMicromachines Center, School of Mechanical and Production Engineering, Nanyang Technological University, Singapore, 639798, Singapore Search for more papers by this author , and HONG ZHUMicromachines Center, School of Mechanical and Production Engineering, Nanyang Technological University, Singapore, 639798, Singapore Search for more papers by this author https://doi.org/10.1142/S1465876303001289Cited by:0 PreviousNext AboutSectionsPDF/EPUB ToolsAdd to favoritesDownload CitationsTrack CitationsRecommend to Library ShareShare onFacebookTwitterLinked InRedditEmail AbstractIn this work, we use a new method to modify the properties of the silicon substrate through MEMS technologies, thus reducing the parasitic losses in high frequency. A 20μm thick SiO2 layer with an air gap is firstly formed to reduce the parasitic resistance and capacitance in the low resistivity silicon substrate. Electroplating technology is used to deposit thick metal layer to reduce the series resistance due to the finite thickness of the conductor. And the performances of inductors fabricated on different substrates have been compared with each other. The electro-magnetic simulations have been performed in the work. It is found that the quality factors of such inductors can reach 15 and its self-resonance frequency is close to 10GHz. These can satisfy many RF applications.Keywords:InductorRFhigh Qresonant frequencymicromachining References R. P. Ribas et al. , Monolithic Micromachined Planar Spiral Transformer ( IEEE , France , 1998 ) . Crossref, Google Scholar Joachim N. Burghartz, Silicon RF Technology-The Two Generic Approaches, IBM T.J.Watson Research Center, Yorktown Hieghts, New York, USA . Google ScholarJ. Burghart, Techn. Dig. IEDM 523 (1998). Google ScholarHongrui Jianget al., IEEE Transactions on microwave theory and techniques 48(12), 2415 (2000). Crossref, Google ScholarMin Parket al., IEEE Microwave and Guided Wave Letters 9(12), (1999). Google ScholarO. Kenneth, IEEE Journal of solid-state circuits 33(8), 1249 (1998). Google Scholar FiguresReferencesRelatedDetails Recommended Vol. 04, No. 02 Metrics History KeywordsInductorRFhigh Qresonant frequencymicromachiningPDF download