Abstract
In order to identify a volatile metallo-organic precursor for the deposition of nickel films for CVD applications, equilibrium vapour pressure ( p e) measurements were carried out on a N, N′-ethylenebis(2,4-pentanedion-iminoato)nickel(II) (Ni[(acac) 2en]) by employing a TG-based transpiration method over the range 406 to 495 K leading to values of 118.0±4.1 and 83.3±3.8 kJ mol −1 for the standard enthalpies of sublimation and vapourisation, respectively of Ni[(acac) 2en]. From the plot of log p e against 1/ T, the melting point was derived to be 463 K, which is in reasonable agreement with 469±3 K reported in the literature and was also observed in DTA and melting point studies.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
