Abstract
X-ray photoelectron spectroscopy (XPS) has been used to characterize theoxidation states in Ta/NiOx/Ni81Fe19/Tamagnetic multilayers prepared by rf reaction and dc magnetron sputtering.The exchange coupling field and the coercivity of NiOx/Ni81Fe19are studied as a function of the ratio of Arto O2 during the deposition process. The chemical states of Niatoms in the interface region of NiOx/NiFe have also been investigatedby XPS and the peak decomposition technique. The results show that the ratioof Ar to O2 has a great effect on the chemical states of nickel inNiOx films. Thus the exchange coupling field and the coercivity ofTa/NiOx/Ni81Fe19/Ta are seriously affected.Also, the experiment shows that XPS is a powerful tool in characterizingmagnetic multilayers.
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