Abstract

A compact cylindrical reflection mirror analyzer for low energy ion scattering spectrometer has been designed and constructed to be used in a vacuum thin film deposition system for in situ analysis of fresh-deposited films. The design of the energy analyzer is similar to that of the ellipsoidal mirror analyzer, consisting of an electrostatic reflection mirror of the cylindrical sector type with a mean radius of curvature of 4.0 cm and a sector angle of 70°, a high pass energy filter, and two slits. The performance of this analyzer has been tested by the scattering of Li+ ions with energies of 606, 707, and 807 eV, respectively, on Al, Ti, Co, Cu, and stainless steel samples at angles from 125° to 155°. An average energy resolution of (1)/(56) has been obtained at an energy band of 10 eV and primary ion energy of 800 eV. Better resolution is expected with a narrower energy band and a higher primary energy. In situ monitoring of thin Cu film deposited on Si substrate in Ar+ ion sputtering process has been done to show the feasibility of this system.

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