Abstract

A block replicate gate composed of an ion-implanted minor loop and a permalloy major line has been developed for 4 μm period bubble devices. This gate employs a hybrid permalloy and ion-implanted bubble device with no junction between the patterns. Test chips incorporating this replicate gate, the folded minor loop, and the cusp-to-cusp bidirectional transfer gate have been fabricated and characterized for a 100 kHz triangular drive field. A bias field margin of 30 Oe was obtained at 70 Oe ± 10 % peak drive field.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.