Abstract
AbstractIn order to investigate the merits of cluster bombardment for inorganic sputter depth profiling, thin (50‐nm) anodic Ta2O5 films were analyzed by ToF‐SNMS using 25 keV Aun+ projectile ions. The same focused primary ion beam was employed both for sputter erosion and (static) data acquisition. Sputtered neutral particles were postionized by means of single photon ionization using a 157 nm F2 excimer laser. The results show that, for the amorphous films investigated here, the transition from mono‐ to polyatomic projectiles does not lead to a significant improvement of the apparent depth resolution. Copyright © 2010 John Wiley & Sons, Ltd.
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