Abstract

ABSTRACTThin dielectric films for optical applications are deposited on substrates using a variety of techniques including reactive sputtering, solgel reaction, and ion assisted plasma deposition. This transmission electron microscopy study characterizes optical coatings produced by the above deposition techniques and shows how changes in deposition conditions change microstructure and as a result the optical properties.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.