Abstract
Radio frequency plasma deposition has been used to deposit phosphorus doped diamond-like carbon (DLC) films on Si and quartz substrates, using a gas mixture consisting of CH4 with additions of 0–90% PH3. XPS studies reveal that the films contain P/C ratios as high as 3:1, although they also contain ∼10% H. The degree of P incorporation in the films and the deposition rate is proportional to the PH3 concentration in the gas phase. SIMS depth profiling shows the films to be homogeneous in composition, although the surfaces are oxidised due to reaction with air. The optical band gap of the films is inversely proportional to the P/C ratio, with values ranging from 2.1 to 2.6 eV.
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