Abstract
Fe–Si catalyst thin films for the growth of carbon nanotubes were prepared using co-sputter deposition. As-deposited Fe–Si films consist of different amounts of α-Fe and amorphous Si. The amount depends on the Si concentration in the film. Hydrogen plasma etched Fe–Si films become particles having different sizes. The particle size is also dependent on the Si concentration. Correlation among the Si concentration, the particle size, and the growth rate of carbon nanotube was made. Optimal growth of carbon nanotubes at 370 °C was obtained at an average particle size of 45 nm or a Si concentration of 21%.
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