Abstract
Solving the statistical equilibrium equations we find line intensity ratios of C III, N III, O III, Si III, and Al III in the visible and ultraviolet range, that are sensitive to electron density and/or temperature in the regime commonly found in pulsed laser deposition. For thin film deposition, the plasma density is between 1012 and 1018 cm−3 and the temperature is close to 104 K. Our results are consistent with experimental data on Al II and Al III, previously reported in the literature. These line intensity ratios are a promising tool to diagnose the physical state of plasmas generated through laser ablation in thin film deposition techniques.
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