Abstract
A complete set of semi-empirical equations has been determined to engineer the damage formation in Lithium Niobate (LN) by irradiation with any ion atomic number and energy in the range 0.1–1.0 MeV/amu. Both nuclear and electronic process were taken into account and in particular the complex regime of sub-threshold electronic damage was quantitatively approached. The chemical etching of the processed material in 50 wt% HF at room temperature has been studied and the dependence of the etching rate on the damage concentration has been quantified. Finally, some test processes for surface micromachining of LN were first planned by using the above equations and then experimentally demonstrated.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
