Abstract
Transparent conducting indiumtinoxide films have been produced by DC magnetron reactive sputtering of an indiumtin target using argonoxygenhydrogen sputter gas mixtures. The addition of hydrogen to the sputtering gas significantly broadens the process window for production of transparent ITO of resistivity <10 −3 Ω cm for substrate temperatures 20–200°C. For higher substrate temperatures (∼ 350°C) the process window is broadened slightly. Electrical and optical properties, and degradation of ITO films of various thickness deposited onto soda glass, silica and polyester are discussed in detail.
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