Abstract
A steady vacuum arc discharge with a consumable anode, the anodic vacuum arc, was used to produce thin Cu and Zn films. This new type of discharge is ignited in vacuum (⩽ 10 −2 Pa) and is sustained by metal vapor produced at the anode. In contrast to the well-known vacuum arcs with consumable cathodes no micro-particles are ejected from the evaporating anode. Deposition rates range from 23 to 65 nm s −1. The thin metallic films are homogeneous and show bulk density. The purity of the deposited metallic films is up to 99.9% and the electric conductivity is close that of the respective bulk material.
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